Standards for New and Existing PAI Sources

Emission source Applicability Requirement Process vents Existing: Processes having uncontrolled organic HAP emissions ≥0.15 Mg/yr 90% for organic HAP per process or to outlet concentration of ≤20 ppmv TOC. Processes having uncontrolled HCl and chlorine emissions ≥6.8 Mg/yr 94% for HCl and chlorine per process or to outlet HCl and chlorine concentration of ≤20 ppmv. Individual process vents meeting flow and mass emissions criteria that have gaseous organic HAP emissions controlled to less than 90% on or after November 10, 1997 98% gaseous organic HAP control per vent or ≤20 ppmv TOC outlet limit. New: Processes having uncontrolled organic HAP emissions ≥0.15 Mg/yr 98% for organic HAP per process or ≤20 ppmv TOC. Processes having uncontrolled HCl and chlorine emissions ≥6.8 Mg/yr and <191 Mg/yr 94% for HCl and chlorine per process or to outlet concentration of ≤20 ppmv HCl and chlorine. Processes having uncontrolled HCl and chlorine emissions ≥191 Mg/yr 99% for HCl and chlorine per process or to outlet concentration of ≤20 ppmv HCl and chlorine. Storage vessels Existing: ≥75 m 3 capacity and vapor pressure ≥3.45 kPa Install a floating roof, reduce HAP by 95% per vessel, or to outlet concentration of ≤20 ppmv TOC. New: ≥38 m 3 capacity and vapor pressure ≥16.5 kPa Same as for existing sources. ≥75 m 3 capacity and vapor pressure ≥3.45 kPa Same as for existing sources. Wastewater a Existing: Process wastewater with ≥10,000 ppmw Table 9 compounds at any flowrate or ≥1,000 ppmw Table 9 compounds at ≥10 L/min, and maintenance wastewater with HAP load ≥5.3 Mg per discharge event Reduce concentration of total Table 9 compounds to <50 ppmw (or other options). New: Same criteria as for existing sources Reduce concentration of total Table 9 compounds to <50 ppmw (or other options). Total HAP load in wastewater POD streams ≥2,100 Mg/yr. 99% reduction of Table 9 compounds from all streams. Equipment leaks Subpart H Subpart H with minor changes, including monitoring frequencies consistent with the proposed CAR. Product dryers and bag dumps Dryers used to dry PAI that is also a HAP, and bag dumps used to introduce feedstock that is a solid and a HAP Particulate matter concentration not to exceed 0.01 gr/dscf. Heat exchange systems Each heat exchange system used to cool process equipment in PAI manufacturing operations Monitoring and leak repair program as in HON. a Table 9 is listed in the appendix to subpart G of 40 CFR part 63.