Pub. L. 104-106, div. A, tit. II, subtit. F, sec. 271

ADVANCED LITHOGRAPHY PROGRAM.

EnactedYear: 1996Length: 309 wordsOfficial source
SEC. 271. ADVANCED LITHOGRAPHY PROGRAM. Section 216 of the National Defense Authorization Act for Fiscal Year 1995 (Public Law 103–337; 108 Stat. 2693) is amended— (1) in subsection (a), by striking out “to help achieve” and all that follows through the end of the subsection and inserting in lieu thereof “to ensure that lithographic processes being developed by United States-owned companies or United States-incorporated companies operating in the United States will lead to superior performance electronics systems for the Department of Defense.”; (2) in subsection (b), by adding at the end the following new paragraph: “(3) The Director of the Defense Advanced Research Projects Agency may set priorities and funding levels for various technologies being developed for the ALP and shall consider funding recommendations made by the Semiconductor Industry Association as being advisory in nature.”; (3) in subsection (c)— (A) by inserting “Defense” before “Advanced”; and (B) by striking out “ARPA” both places it appears and inserting in lieu thereof “DARPA”; and (4) by adding at the end the following: “(d) Definitions.— In this section: “(1) The term ‘United States-owned company’ means a company the majority ownership or control of which is held by citizens of the United States. “(2) The term ‘United States-incorporated company’ means a company that the Secretary of Defense finds is incorporated in the United States and has a parent company that is incorporated in a country— “(A) that affords to United States-owned companies opportunities, comparable to those afforded to any other company, to participate in any joint venture similar to110 STAT. 239 those authorized under section 28 of the National Institute of Standards and Technology Act (15 U.S.C. 278n); “(B) that affords to United States-owned companies local investment opportunities comparable to those afforded to any other company; and “(C) that affords adequate and effective protection for the intellectual property rights of United States-owned companies.”.
Pub. L. 104-106, div. A, tit. II, subtit. F, sec. 271: ADVANCED LITHOGRAPHY PROGRAM. | Justis AI