R 336.2155 Monitor location for continuous emission monitoring systems.

Rule 1155. (1) The owner or operator of a source subject to provisions of this part shall install the required continuous monitoring systems or monitoring devices such that representative measurements of emissions or process parameters from the affected facility are obtained. (2) When the effluents from 2 or more affected facilities of similar design and operating characteristics are combined before being released into the atmosphere, the owner or operator of a source subject to the provisions of this part may install monitoring systems on the combined effluent. When the affected facilities are not of similar design and operating characteristics, or when the effluent from 1 affected facility is released into the atmosphere through more than 1 point, the owner or operator shall establish alternate procedures to implement the intent of these requirements subject to approval by the department.