Default Emission Factors (1-U ij ) for Gas Utilization Rates (U ij ) and By-Product Formation Rates (B ijk ) for Semiconductor Manufacturing for Use With the Stack Test Method

Table I-11 to Subpart I of Part 98—Default Emission Factors (1-U ij ) for Gas Utilization Rates (U ij ) and By-Product Formation Rates (B ijk ) for Semiconductor Manufacturing for Use With the Stack Test Method [150 mm and 200 mm Wafers] All processes Process gas i CF 4 C 2 F 6 CHF 3 CH 2 F 2 C 2 HF 5 CH 3 F C 3 F 8 C 4 F 8 NF 3 NF 3 Remote SF 6 C 4 F 6 C 5 F 8 C 4 F 8 O 1-U i 0.79 0.55 0.51 0.13 0.064 0.70 0.40 0.12 0.18 0.028 0.58 0.083 0.072 0.14 BCF 4 NA 0.19 0.085 0.079 0.077 NA 0.20 0.11 0.11 0.015 0.13 0.095 NA 0.13 BC 2 F 6 0.027 NA 0.035 0.025 0.024 0.0034 NA 0.019 0.0059 NA 0.10 0.073 0.014 0.045 BC 4 F 8 NA NA NA NA NA NA NA NA NA NA NA NA NA NA BC 3 F 8 NA NA NA NA NA NA NA NA NA NA NA NA NA NA BC 5 F 8 0.00077 NA 0.0012 NA NA NA NA 0.0043 NA NA NA NA NA NA BCHF 3 0.060 0.0020 NA 0.049 NA NA NA 0.020 NA NA 0.0011 0.066 0.0039 NA BF 2 NA NA NA NA NA NA NA NA NA 0.50 NA NA NA NA Notes: NA = Not applicable; i.e. , there are no applicable emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type. [89 FR 31921, Apr. 25, 2024]