Default Emission Factors (1-U ij ) for Gas Utilization Rates (U ij ) and By-Product Formation Rates (B ijk ) for Semiconductor Manufacturing for Use With the Stack Test Method

Table I-12 to Subpart I of Part 98—Default Emission Factors (1-U ij ) for Gas Utilization Rates (U ij ) and By-Product Formation Rates (B ijk ) for Semiconductor Manufacturing for Use With the Stack Test Method [300 mm and 450 mm Wafers] All processes Process gas i CF 4 C 2 F 6 CHF 3 CH 2 F 2 CH 3 F C 3 F 8 C 3 F 8 Remote C 4 F 8 NF 3 NF 3 Remote SF 6 C 4 F 6 C 5 F 8 C 4 F 8 O 1-U i 0.65 0.80 0.37 0.20 0.30 0.30 0.063 0.183 0.19 0.018 0.30 0.15 0.100 NA BCF 4 NA 0.21 0.076 0.060 0.029 0.21 NA 0.045 0.040 0.037 0.033 0.059 0.109 NA BC 2 F 6 0.058 NA 0.058 0.043 0.0093 0.18 NA 0.027 0.0204 NA 0.041 0.062 0.083 NA BC 4 F 6 0.0083 NA 0.01219 NA 0.001 NA NA 0.008 NA NA NA NA NA NA BC 4 F 8 0.0046 NA 0.00272 0.054 0.007 NA NA NA NA NA NA 0.0051 NA NA BC 3 F 8 NA NA NA NA NA NA NA NA NA NA NA NA 0.00012 NA BCH 2 F 2 0.005 NA 0.0024 NA 0.0033 NA NA 0.0021 0.00034 0.00088 0.000020 0.000030 NA NA BCH 3 F 0.0061 NA 0.027 0.0036 NA 0.0007 NA 0.0063 0.0036 0.0028 0.0082 0.00065 NA NA BCHF 3 0.012 NA NA 0.057 0.016 0.012 NA 0.028 0.0106 0.000059 0.0039 0.017 0.0069 NA BF 2 NA NA NA NA NA NA NA NA NA 0.50 NA NA NA NA [89 FR 31922, Apr. 25, 2024]